Undergraduate Degree




DV2011 Pattern, Art, Design and Architecture

[Studio Contact Hours: 39 hours; Pre-requisites: NIL; Academic Unit: 3.0]




Academic Unit


3 AU

Course Description


Learning Objective

Within an art, design and architectural context and through studio-based teaching, the student will be introduced to the creative potential of pattern and ornamentation using digital image technologies and non-traditional fabrication methods.


From fashion to product design, from interior design to architectural installation, animation and interactive arts, pattern will be explored together with its application in the artistic and commercial domain. The course will examine how the image combined with digital and traditional painted and drawn mediums affects the significance of the surface, structure and space. Non-traditional media will be examined such as; textiles, metals, plastics, laminates, 2D and 3D digital printmaking etc. Explored will be assortment of special commercial and custom-coated substrates as well as large scale rendering and digital pre-visualizations for art space installations.

Course Outline




• Introduction to the course

• Introduction to Pattern

- Ornament, archaeology, myths and Rituals

2 - 6

• Pattern as Surface Decoration / "Body": 

- Experimental analogue and digital methodologies for pattern creation 

• Pattern as a structure / "Space": 

- Woven, knitted, knotted, twisted, creased, folded, unfolded structures

• Art within architecture:

- The site specific installation, the volume, the human within a volume, the walk-through etc


• Mid Semester review of assignments

8 - 12

• Prototyping and print on various substrates

• Pattern in Space: 

- Digital visualization prototyping for site specific architectural locations


• Final project development

Learning Outcome

To give students a broad, practice-based overview of the range of creative options within the field of installation based digital imaging and non-traditional fabrication methods.

Student Assessment

  1. Final Assessment: 30%

  2. Continuous Assessment: 70% (of which at least 15% is participation)

Continuous assessment components will include:

  • Studio-based exercises and projects

  • Individual, group and team-based assignments


Recommended Reading/Reference:

  1. Estel Vilaseca, Cutting-Edge Patterns and Textures, (Book & CD Rom), Rockport Publishers. (April, 2008)

  2. Barbara Glasner, Patterns 2. Design, Art and Architecture (No. 2), Birkhäuser Basel; 1st edition (June 6, 2008)

  3. Victionary, Graphics Alive, Index Book, (December 4, 2006)

  4. Lou Andrea Savoir, Pattern Design: Applications and Variations, Rockport Publishers, (November 1, 2007)